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The book shows the progress of integrated CMOS PIN and avalanche photodiodes as well as low-noise amplifiers. Newest research results are introduced and comprehensively detailed.

The book presents the basic theory of lasers for a beginner and their applications in interdisciplinary field of science and technology.

Extreme ultraviolet (EUV) lithography is a next generation platform with the potential to extend Moore''s Law. The EUV mirror is a fundamental component of this system. Efficient Extreme Ultraviolet Mirror Design describes an approach to designing EUV mirrors with reduced computational time and memory requirements, providing a comprehensive grounding in the fundamentals of the EUV mirror and knowledge of the finite-difference time-domain (FDTD) method. The discussion is made timely by the opening of commercial avenues for the application of EUV as it begins to be implemented in the development of 5G, AI, edge computing, VR and the Internet of Things. This book explores the theory, function and fabrication of EUV mirrors, as well as the correlation between design by Fresnel''s equations and design by photonic bands, and develops a rigorous and efficient FDTD method by applying these considerations to three simulation cases. Intended primarily for EUV industry professionals, Efficient Extreme Ultraviolet Mirror Design will be of particular use to researchers investigating large scale problems or near-field scattering problems in EUV lithography. It will serve as an excellent reference text for anyone working in or studying optical engineering, as well as a high-level introduction for researchers from other fields interested in photolithography and the FDTD method. Key Features  Addresses knowledge of extreme ultraviolet (EUV) mirrors and EUV lithography. Establishes a relation between photonic bands and Fresnel''s equation. Introduces the high reflectivity EUV mirror design rules. Applies numerical simulation for EUV mirror design. Details efficient finite-difference time-domain (FDTD) approach. 

In recent years, the field of digital photoelasticity has begun to stabilise. Developments in Photoelasticity presents, in one volume, the time-tested advancements that have brought about a fundamental change in employing photoelastic analysis to solve diverse applications. Based on decades of active research, this authoritative treatment surveys wide-ranging connections in the field, focusing on developments made since 2010. Wide-ranging in its application, this high-level reference text is an invaluable tool for stress analysts, teachers of photo-mechanics and industry practitioners involved in stress analysis, solid mechanics, fracture mechanics, glass stress analysis, and contact mechanics. It also serves as a link between active research and teaching at graduate and senior undergraduate level.Key Features:Establishes the basics of photoelasticity with clarity to serve as a primary reference for users of the methodologyExplains phase-shifting methods that are robust enough to allow the reader to implement them with ease.Explores modern methods based on colour information processing using a single isochromatic image as well as use of conventional polariscopes for complete photoelastic analysis.Provides carrier fringe analysis tools for quantifying low stress field information for special applications.Extensive information on a variety of applications of photoelasticity covering domains ranging from biomedical to aerospace to civil engineering applications.Highlights large scale photoelastic studies in granular materials with applications in plant biology, neurobiology and biomimetics

This book presents singular optics in a gradual and systematic manner and bridges the gap between a seasoned researcher and a student who aims to pursue research in this topic. The book includes illustrations, examples and references that will enable the reader to conceive their own ideas as they discover more about singular optics.