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Rapid Thermal Processing for Future Semiconductor Devices

Om Rapid Thermal Processing for Future Semiconductor Devices

A collection of papers which were presented at the 2001 International Conference on Rapid Thermal Processing (RTP 2001) held at Ise Shima, Mie, on November 14-16, 2001. It covers the following areas such as advanced MOS gate stack, integration technologies, advancd channel engineering including shallow junction, SiGe and hetero-structure.

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  • Språk:
  • Engelsk
  • ISBN:
  • 9780444513397
  • Bindende:
  • Paperback
  • Sider:
  • 160
  • Utgitt:
  • 2. april 2003
  • Dimensjoner:
  • 234x156x9 mm.
  • Vekt:
  • 310 g.
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Leveringstid: 2-4 uker
Forventet levering: 25. august 2025

Beskrivelse av Rapid Thermal Processing for Future Semiconductor Devices

A collection of papers which were presented at the 2001 International Conference on Rapid Thermal Processing (RTP 2001) held at Ise Shima, Mie, on November 14-16, 2001. It covers the following areas such as advanced MOS gate stack, integration technologies, advancd channel engineering including shallow junction, SiGe and hetero-structure.

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